Growth and Characterization of Nanomaterials

Aim

The course should give knowledge about the mechanisms and processes for synthesis and microstructural evolution of thin films from the vapor phase, and an in-depth knowledge about the principles for modern measurement techniques that are being used in todays materials science. Included is also an overview of methods used for thin film synthesis and industrial applications thereof. After the course the student should be able to:

• explain the fundamental atomistic mechanisms and processes that control film formation and microstructural evolution and to describe the effect of process conditions on the film growth.
• explain the principles of interaction between solid materials and electromagnetic radiation, electrons, and ions, and how this can be utilized for diffraction and to obtain contrast.
• draw conclusions regarding the applicability of the different characterization techniques and to explain how these complement each other for fundamental materials analysis.
• analyze and draw conclusions based on the obtained measured data.
• summarize the results that are obtained from the characterization techniques in the form of a scientific article.

Content

The lectures discuss vapor condensation and adsorption of atoms, surfaces and surface diffusion, epitaxy and growth modes, thin film nucleation and coalescence, and growth and microstructural evolution of polycrystalline films. A thin film growth laboration is included.

Characterization of thin films are made by analyzing the interaction of solid materials and electromagnetic radiation, electrons, and ions. The principles for and the usage of the material analysis techniques X-ray photo electron spectroscopy (XPS), X-ray and electron diffraction (XRD and ED), electron microscopy (SEM and TEM), and energy-dispersive X-ray analysis (EDX) will be treated in lectures and in laborations.